多孔ポリイミドを高圧露光装置を開発して作成する方法に関する論文です．
Kentaro Taki, Hiroshi Ito, Development of a High-Intensity UV Exposure Apparatus under a High-Pressure CO2 Gas Atmosphere to Manufacture Large-Area Porous Ultralow-k Polyimide Substrates for Flexible Print Circuits, Journal of Photopolymer Science and Technology, 28(6), 747-754 (2015).
Abstract
http://doi.org/10.2494/photopolymer.28.747
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https://www.jstage.jst.go.jp/article/photopolymer/28/6/28_747/_pdf